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Electron traps created in gate oxides by Fowler-Nordheim injections pp. 227-231(5) Authors: Auriel G.; Oualid J.; Vuillaume D.
S. Y. Hong, G. Tobias, B. Ballesteros, F. El Oualid, J. C. Errey, K. J. Doores, Angus I Kirkland, Peter D Nellist, L. H. Malcolm and B. G. Davis , Atomic-scale detection of ...
... in WSi2 or TaSi2 polycide process: influence of the nitridation temperature pp. 937-942(6) Authors: Yckache K.; Boivin P.; Baiget F.; Radjaa S.; Auriel G.; Sagnes B.; Oualid J ...
S.Y. Hong, G. Tobias, B. Ballesteros, F. El Oualid, J.C. Errey, K.J. Doores, A.I. Kirkland, P.D. Nellist, M.L.H. Green , B.G. Davis J. Am. Chem. Soc. 2007, 129, 10966-10967 | pdf
S. Y. Hong, G. Tobias, B. Ballesteros, F. El Oualid, J. C. Errey, K. J. Doores, Angus I Kirkland, Peter D Nellist, L. H. Malcolm and B. G. Davis , Atomic-scale detection of ...
Electron traps created in gate oxides by Fowler-Nordheim injections pp. 227-231(5) Authors: Auriel G.; Oualid J.; Vuillaume D.
S. Y. Hong, G. Tobias, B. Ballesteros, F. El Oualid, J. C. Errey, K. J. Doores, Angus I Kirkland, Peter D Nellist, L. H. Malcolm and B. G. Davis , Atomic-scale detection ...
... or TaSi2 polycide process: influence of the nitridation temperature pp. 937-942(6) Authors: Yckache K.; Boivin P.; Baiget F.; Radjaa S.; Auriel G.; Sagnes B.; Oualid J ...
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